Utilize este identificador para referenciar este registo: https://hdl.handle.net/1822/15684

TítuloStructure and chemical bonds in reactively sputtered black Ti–C–N–O thin films
Autor(es)Chappé, J. M.
Marco de Lucas, M. C.
Cunha, L.
Moura, C.
Pierson, J. F.
Imhoff, L.
Heintz, O.
Potin, V.
Bourgeois, S.
Vaz, F.
Palavras-chaveTitanium oxy-carbo-nitrides
Reactive sputtering
Transmission electron Microscopy
Raman spectroscopy
X-ray photoelectron Spectroscopy
Data31-Out-2011
EditoraElsevier 1
RevistaThin Solid FIlms
Resumo(s)The evolution of the nanoscale structure and the chemical bonds formed in Ti–C–N–O films grown by reactive sputtering were studied as a function of the composition of the reactive atmosphere by increasing the partial pressure of an O2+N2 gas mixture from 0 up to 0.4 Pa, while that of acetylene (carbon source) was constant. The amorphisation of the films observed by transmission electron microscopy was confirmed by micro- Raman spectroscopy, but it was not the only effect associated to the increase of the O2+N2 partial pressure. The chemical environment of titanium and carbon, analysed by X-ray photoemission spectroscopy, also changes due to the higher affinity of Ti towards oxygen and nitrogen than to carbon. This gives rise to the appearance of amorphous carbon coexisting with poorly crystallized titanium oxynitride. The evolution of the films colour is explained on the basis of these structural changes.
TipoArtigo
URIhttps://hdl.handle.net/1822/15684
DOI10.1016/j.tsf.2011.06.108
ISSN0040-6090
Versão da editorahttp://www.sciencedirect.com/
Arbitragem científicayes
AcessoAcesso aberto
Aparece nas coleções:CDF - GRF - Artigos/Papers (with refereeing)

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