Utilize este identificador para referenciar este registo:
https://hdl.handle.net/1822/89644
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Campo DC | Valor | Idioma |
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dc.contributor.author | Cunha, Florival Moura | por |
dc.contributor.author | Silva, Manuel Fernando Ribeiro | por |
dc.contributor.author | Correia, J. H. | por |
dc.date.accessioned | 2024-03-18T11:21:25Z | - |
dc.date.available | 2024-03-18T11:21:25Z | - |
dc.date.issued | 2022-09-07 | - |
dc.identifier.uri | https://hdl.handle.net/1822/89644 | - |
dc.description.abstract | The Atomic Layer Deposition (ALD) technique can be used to increase the lifetime of microfabricated rubidium vapor cells (magnetic sensors for magnetoencephalography) by an ultra-thin coating layer deposited on the internal cell walls (Figure 1). The ALD presents excellent control over the ultra thin films thickness (< 20 nm) and allows complex 3D structures to be covered with a high-aspect-ratio coating. This work shows the characterization of alumina (Al2O3) and silicon dioxide (SiO2) ultra-thin films deposited by Thermal ALD (ThALD) and Plasma-Enhanced ALD (PEALD). | por |
dc.description.sponsorship | This work was supported by: project MME and FCT with the project MPhotonBiopsy, PTDC/FIS-OTI/1259/2020, Infrastructures Micro&NanoFabs@PT, reference NORTE-01-0145-FEDER-022090, POR Norte, Portugal 2020. | por |
dc.language.iso | eng | por |
dc.relation | info:eu-repo/grantAgreement/FCT/3599-PPCDT/PTDC%2FFIS-OTI%2F1259%2F2020/PT | por |
dc.rights | openAccess | por |
dc.subject | Atomic Layer Deposition | por |
dc.subject | ALD | por |
dc.subject | Al2O3 | por |
dc.subject | SiO2 | por |
dc.subject | Thin-films | por |
dc.title | Characterization of Al2O3 and SiO2 ultra thin-films deposited by ALD for microfabricated rubidium vapor cells | por |
dc.type | conferencePoster | por |
dc.peerreviewed | yes | por |
oaire.citationConferenceDate | 07 Set. - 08 Set. 2022 | por |
sdum.event.title | 12th Ibero-American Congress on Sensors (IBERSENSOR) | por |
sdum.event.type | conference | por |
oaire.citationConferencePlace | Aveiro, Portugal | por |
dc.subject.fos | Engenharia e Tecnologia::Engenharia Eletrotécnica, Eletrónica e Informática | por |
Aparece nas coleções: | DEI - Artigos em atas de congressos internacionais |
Ficheiros deste registo:
Ficheiro | Descrição | Tamanho | Formato | |
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Poster_FCuha_FSilva_FCunha.pdf | 1,32 MB | Adobe PDF | Ver/Abrir |