Utilize este identificador para referenciar este registo: https://hdl.handle.net/1822/61373

TítuloStructural and electrical properties of Al doped ZnO thin films deposited at room temperature on poly(vinilidene fluoride) substrates
Autor(es)Oliveira, C.
Rebouta, L.
de Lacerda-Arôso, T.
Lanceros-Méndez, S.
Viseu, T. M. R.
Tavares, C. J.
Tovar, J.
Ferdov, S.
Alves, E.
Palavras-chaveAZOY
Reactive magnetron sputtering
Electroactive polymers
Electrical properties
Data2009
EditoraElsevier Science SA
RevistaThin Solid Films
Resumo(s)Transparent, conducting, Al-doped ZnO films have been deposited, by dc and pulsed dc magnetron sputtering, on glass and electroactive polymer (poly(vinylidene fluoride)-PVDF) substrates. Samples have been prepared at room temperature varying the argon sputtering pressure, after optimizing other processing conditions. All ZnO:Al films are polycrystalline and preferentially oriented along the [002] axis. Electrical resistivity around 3.3 x 10(-3) Omega cm and optical transmittance of similar to 85% at 550 nm have been obtained for AZOY films deposited on glass, while a resistivity of 1.7 x 10(-2) Omega cm and transmittance of similar to 70% at 550 nm have been attained in similar coatings on PVDF. One of the main parameters affecting film resistivity seems to be the roughness of the substrate.
TipoArtigo
URIhttps://hdl.handle.net/1822/61373
DOI10.1016/j.tsf.2009.02.069
ISSN0040-6090
Arbitragem científicayes
AcessoAcesso aberto
Aparece nas coleções:CDF - GRF - Artigos/Papers (with refereeing)


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