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https://hdl.handle.net/1822/55126
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Campo DC | Valor | Idioma |
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dc.contributor.author | Cristea, D. | por |
dc.contributor.author | Cunha, L. | por |
dc.contributor.author | Patru, M. | por |
dc.contributor.author | Munteanu, D. | por |
dc.date.accessioned | 2018-06-25T11:04:33Z | - |
dc.date.issued | 2015 | - |
dc.identifier.citation | D. Cristea, L. Cunha, M. Pătru, D. Munteanu, Investigations on magnetron sputtered tantalum oxynitride thin films. Materials Science. Non-Equilibrium Phase Transformations, issue 2/2015 (2015) 30-33 | por |
dc.identifier.issn | 1310-3946 | - |
dc.identifier.uri | https://hdl.handle.net/1822/55126 | - |
dc.description.abstract | Tantalum oxynitride thin solid films have been deposited by reactive magnetron sputtering, using a fixed proportion reactive gas mixture (85% N2 + 15% O2) but with varying partial pressures, onto silicon (100) wafer substrates. The physical integrity was observed after vacuum thermal annealing at temperatures from 100 °C to 800 °C. The structural evolution on the as deposited and annealed samples was obtained by X-ray Diffraction. For the lowest partial pressure, the crystalline structure is that of tetragonal β-Ta. Increasing the reactive gas partial pressure leads to the formation of fcc-Ta(O,N) crystals, with various orientations (111, 200, 220).The higher partial pressure films are amorphous. The thermal annealing induces a phase transformation, from tetragonal β-Ta to hexagonal TaNx (x<1). AFM measurements resulted in low RMS roughness values, regardless of the partial pressure or the annealing temperature. | por |
dc.description.sponsorship | This work was supported by FEDER through the COMPETE Program and by the Portuguese Foundation for Science and Technology (FCT) in the framework of the Strategic Project PESTC/FIS/UI607/2011 and by the Sectoral Operational Programme Human Resources Development (SOP HRD), financed from the European Social Fund and by the Romanian Government under the project number POSDRU/159/1.5/S/134378. | por |
dc.language.iso | eng | por |
dc.relation | PESTC/FIS/UI607/2011 | por |
dc.rights | restrictedAccess | por |
dc.subject | Tantalum oxynitride | por |
dc.subject | Thin film | por |
dc.subject | Sputtering | por |
dc.subject | Microstructure | por |
dc.title | Investigations on magnetron sputtered tantalum oxynitride thin films | por |
dc.type | conferencePaper | por |
dc.peerreviewed | yes | por |
dc.relation.publisherversion | http://mtmcongress.com/proceedngs/2015/2/09.INVESTIGATIONS%20ON%20MAGNETRON%20SPUTTERED%20TANTALUM%20OXYNITRIDE%20THIN%20FILMS.pdf | por |
oaire.citationStartPage | 35 | por |
oaire.citationEndPage | 38 | por |
oaire.citationIssue | XXIII | por |
oaire.citationVolume | 2 | por |
dc.subject.fos | Engenharia e Tecnologia::Engenharia dos Materiais | por |
dc.description.publicationversion | info:eu-repo/semantics/publishedVersion | por |
sdum.conferencePublication | SCIENTIFIC PROCEEDINGS XII INTERNATIONAL CONGRESS "MACHINES, TECHNOLОGIES, MATERIALS" 2015 | por |
Aparece nas coleções: | CDF - GRF - Outros Documentos/Other Documents (without refereeing) |
Ficheiros deste registo:
Ficheiro | Descrição | Tamanho | Formato | |
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24_CRISTEA_mtm15.pdf Acesso restrito! | 1,2 MB | Adobe PDF | Ver/Abrir |