IBA study of SiGe/SiO2 nanostructured multilayers

doi:10.1016/j.nimb.2013.11.025

Utilize este identificador para referenciar este registo: https://hdl.handle.net/1822/33632

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Campo DC	Valor	Idioma
dc.contributor.author	Barradas, N. P.	por
dc.contributor.author	Alves, E.	por
dc.contributor.author	Vieira, E. M. F.	por
dc.contributor.author	Parisini, A.	por
dc.contributor.author	Conde, O.	por
dc.contributor.author	Martín-Sánchez, J.	por
dc.contributor.author	Rolo, Anabela G.	por
dc.contributor.author	Chahboun, A.	por
dc.contributor.author	Gomes, M. J. M.	por
dc.date.accessioned	2015-02-05T17:31:19Z	-
dc.date.available	2015-02-05T17:31:19Z	-
dc.date.issued	2014	-
dc.identifier.citation	Barradas, N. P., Alves, E., Vieira, E. M. F., Parisini, A., Conde, O., Martín-Sánchez, J., . . . Gomes, M. J. M. (2014). IBA study of SiGe/SiO2 nanostructured multilayers. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 331, 89-92.	por
dc.identifier.issn	0168-583X	por
dc.identifier.uri	https://hdl.handle.net/1822/33632	-
dc.description.abstract	SiGe/SiO2 multilayers with layer thickness of 5 nm were deposited with RF magnetron sputtering. The as deposited samples had well defined SiGe amorphous layers. Different annealing treatments were made to promote the formation of SiGe nanocrystals. We report an ion beam analysis study with the Rutherford backscattering and elastic recoil analysis detection techniques, in order to determine the thickness and composition of the nanolayers, and gain insight into the evolution of the roughness of the layers. The results are correlated with other structural properties of the samples, as measured with complementary techniques such as grazing incidence X-ray diffraction annular dark field scanning transmission electron microscopy and high resolution transmission electron microscopy.	por
dc.description.sponsorship	This study has been partially funded by: (i) FEDER through the COMPETE Program and by the Portuguese Foundation for Science and Technology (FCT) in the framework of the Strategic Project PTDC/FIS/70194/2006; (ii) European COST Actions MP0901-NanoTP and MP0903-NanoAlloy; (iii) the transnational access framework of the ANNA Eu Project (Contract No. 026134-RII3) through the funding of the ANNA_TA_UC9_RP006 proposal. E.M.F.V is grateful for financial support through the FCT and POPH grant SFRH/BD/45410/2008. J.M.S is grateful for financial support through the Spanish CSIC JAE-DOC-070/01 program co-funded by FSE. The authors acknowledge the Engineer Jose Santos for technical support at Thin Film Laboratory.	por
dc.language.iso	eng	por
dc.publisher	Elsevier 1	por
dc.rights	restrictedAccess	por
dc.subject	Ion beam analysis	por
dc.subject	Nanostructured multilayers	por
dc.subject	SiGe/SiO2	por
dc.title	IBA study of SiGe/SiO2 nanostructured multilayers	por
dc.type	article	por
dc.peerreviewed	yes	por
oaire.citationStartPage	89	por
oaire.citationEndPage	92	por
oaire.citationTitle	Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms	por
oaire.citationVolume	331	por
dc.identifier.doi	10.1016/j.nimb.2013.11.025	por
dc.subject.fos	Ciências Naturais::Ciências Físicas	por
dc.subject.wos	Science & Technology	por
sdum.journal	Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions With Materials and Atoms	por
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