Utilize este identificador para referenciar este registo:
https://hdl.handle.net/1822/27167
Título: | Electrical and photocatalytic behaviour of TAOxNy magnetron sputtered thin solid films |
Autor(es): | Cristea, D. Crisan, A. Barradas, N. P. Alves, E. Costa, P. Lanceros-Méndez, S. Cunha, L. |
Palavras-chave: | Tantalum oxynitride Sputtering Thin films |
Data: | 2013 |
Editora: | Editura Stiintifica FMR |
Revista: | Metalurgia International |
Citação: | Metalurgia International vol. XVIII (2013) Special Issue no. 6 |
Resumo(s): | Tantalum oxynitride thin films were deposited by reactive magnetron sputtering in a N2+O2 (85%+15%) atmosphere, with increasing total reactive gas flows. The chemical composition was determined by RBS and the structural development by XRD. The electrical resistivity was measured using the 2-point and 4-point probe techniques. The photocatalytic behavior was determined on glass samples in UV, using methylene-blue as a pollutant. It was observed that, depending on the deposition process parameters, the samples can be divided into 4 zones, each with a characteristic structure and subsequent behavior. The samples from zone I can be attributed to the β-Ta phase, metallic, conductive. The samples from zone II can be attributed to a fcc Ta(O, N) structure, with N/Ta higher than O/Ta, with increasing electrical resistivity. The samples from zone III are oxide-like, amorphous, electrically insulating. |
Tipo: | Artigo |
URI: | https://hdl.handle.net/1822/27167 |
ISSN: | 1582-2214 |
Arbitragem científica: | yes |
Acesso: | Acesso restrito UMinho |
Aparece nas coleções: | CDF - GRF - Artigos/Papers (with refereeing) |
Ficheiros deste registo:
Ficheiro | Descrição | Tamanho | Formato | |
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TaON photocatalytic MI 2013.pdf Acesso restrito! | versão pré-final | 252,22 kB | Adobe PDF | Ver/Abrir |