Utilize este identificador para referenciar este registo:
https://hdl.handle.net/1822/13752
Título: | Crystal size and crystalline volume fraction effects on the Erbium emission of nc-Si:Er grown by r.f. sputtering |
Autor(es): | Cerqueira, M. F. Stepikhova, M. Kozanecki, A. Andrês, G. Alves, E. |
Palavras-chave: | Nanocrystalline silicon Erbium doping Erbium emission |
Data: | 2010 |
Editora: | American Scientific Publishers |
Revista: | Journal of Nanoscience and Nanotechnology |
Resumo(s): | Erbium-doped low-dimensional Si films with different microstructures were grown by reactive magnetron sputtering on glass substrates by varying the deposition parameters. Their structure and chemical composition were studied by micro-Raman and Rutherford backscattering spectrometry, respectively. In this contribution the Erbium emission is studied as a function of nanocrystalline fraction and average crystal sizes and also as a function of the matrix chemical composition. We discuss the temperature dependence of the Er3+ emission as well as the possible explanations of the low Er active fraction. |
Tipo: | Artigo |
URI: | https://hdl.handle.net/1822/13752 |
DOI: | 10.1166/jnn.2010.1380 |
ISSN: | 1533-4880 |
Versão da editora: | http://www.ingentaconnect.com/content/asp/jnn/2010/00000010/00000004/art00060 |
Arbitragem científica: | yes |
Acesso: | Acesso aberto |
Aparece nas coleções: | CDF - CEP - Artigos/Papers (with refereeing) |
Ficheiros deste registo:
Ficheiro | Descrição | Tamanho | Formato | |
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EE-Si-JNN2010.pdf | Documento principal | 318,89 kB | Adobe PDF | Ver/Abrir |